Clean surfaces are a vital element in the world of semiconductors.  Cleanliness affects not only processing, but, in the case of detectors, imaging as well.  We have developed (and are constantly improving) a variety of processes for the critical cleaning of both front and back illuminated devices.  Our cleaning procedures can be used on all devices, independent of its state--packaged, unpackaged, coated, or bare silicon.  All critical cleaning is completed in our Class 1,000 modular cleanroom.  At right, Teresa inspects a wafer for cleanliness in the Thin Films cleanroom.

 Charles removes a device from an oven used exclusively for ultra high purity hot isopropyl alcohol process.

 Ozone/UV and Plasma Cleaners